| 摘要 |
PURPOSE: To easily change the inclination angle of a nozzle to the surface of a substrate according to membrane thickness, kinds of membrane and kinds of dirt, etc., on the surface of the substrate. CONSTITUTION: A nozzle 12 is formed on a support axis 10 rotating around the 3rd axial center P3 in the vertical direction through the 1st and the 2nd support brackets 11a, 11b. A point at which washing liquid jetted from the nozzle 12 arrives on the surface of the substrate is moved to the outer peripheral end edge from the center of rotation C of a substrate W, and the washing liquid is jetted and fed at high pressure from the nozzle 12 in a pinpoint state on the surface of the substrate W rotatably held. To the 1st support bracket 11a, the 2nd support bracket 11b is fitted with the washing liquid being jetted to the center of rotation C on the surface of the substrate from the nozzle 12 through a circular-arcuate slot 13 on a virtual circle around the center of rotation C in a plane which contains the center of rotation C and the tip of the nozzle 12. Even when an inclination angle of the nozzle 12 is changed, the arrival point of the jet is surely passed through the center of rotation C of the substrate W.
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