发明名称 |
Method of manufacturing soft-magnetic multilayer thin film including re-dissolution effect magnetically isolating layer |
摘要 |
A soft-magnetic multilayer thin film produced by electroplating, wherein an anode-dissolution process is effected by intermittently applying a reverse d.c. bias current with respect to the plating-forward current. Involving the anode-dissolution process allows the formation of a re-dissolution effect layer differing in crystal structure from the plated film layer. A soft-magnetic multilayer thin film characterized by having a multilayer film structure which comprises a plated layer and a re-dissolution effect layer laminated to each other and which the plated layer is at least magnetically isolated. Further, a method of manufacturing a soft-magnetic multilayer thin film having a multilayer film structure magnetically isolated only through plating, which is offered by introducing the anode-dissolution process. In a thin-film magnetic head produced by using a soft-magnetic multilayer thin film, the soft-magnetic multilayer thin film serves as at least one of an upper magnetic core layer and a lower magnetic core layer.
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申请公布号 |
US5575897(A) |
申请公布日期 |
1996.11.19 |
申请号 |
US19950547560 |
申请日期 |
1995.10.24 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
KOMURA, NOBUYUKI;OMATA, YUUJI |
分类号 |
G11B5/31;H01F10/12;H01F10/32;H01F41/26;(IPC1-7):C25D5/10 |
主分类号 |
G11B5/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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