发明名称 Method of manufacturing soft-magnetic multilayer thin film including re-dissolution effect magnetically isolating layer
摘要 A soft-magnetic multilayer thin film produced by electroplating, wherein an anode-dissolution process is effected by intermittently applying a reverse d.c. bias current with respect to the plating-forward current. Involving the anode-dissolution process allows the formation of a re-dissolution effect layer differing in crystal structure from the plated film layer. A soft-magnetic multilayer thin film characterized by having a multilayer film structure which comprises a plated layer and a re-dissolution effect layer laminated to each other and which the plated layer is at least magnetically isolated. Further, a method of manufacturing a soft-magnetic multilayer thin film having a multilayer film structure magnetically isolated only through plating, which is offered by introducing the anode-dissolution process. In a thin-film magnetic head produced by using a soft-magnetic multilayer thin film, the soft-magnetic multilayer thin film serves as at least one of an upper magnetic core layer and a lower magnetic core layer.
申请公布号 US5575897(A) 申请公布日期 1996.11.19
申请号 US19950547560 申请日期 1995.10.24
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 KOMURA, NOBUYUKI;OMATA, YUUJI
分类号 G11B5/31;H01F10/12;H01F10/32;H01F41/26;(IPC1-7):C25D5/10 主分类号 G11B5/31
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