| 摘要 |
A processing method based on resist pattern formation, includes the steps of forming an electrostatic latent image on a photosensitive rotating drum, forming a toner image on the drum by developing the electrostatic latent image with a hot-melt toner, transferring the toner image on the drum onto a processing target member made of a material that is dissolved by an etchant, in accordance with hot-melt transfer, and processing the processing target member based on the toner image thereon as a resist pattern. The processing step has an etching step of causing the etchant to act on a surface of the processing target member on which the resist pattern has been transferred, thereby selectively etching the surface of the processing target member.
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