| 摘要 |
A transport drive system for use in a sputtering apparatus, particularly an in-line sputtering apparatus, is disclosed. The system transports a plurality of planar substrates and includes a plurality of transport beams (71) having a C-shaped cross section. Each transport beam has a first and second end, a first and second sides, a top surface, and a channel, disposed under the top portion, and forming a portion of the C-shaped cross section. The transport beam includes a substrate carrier (72) which secures the substrate or pallet (80) at the top portion of the substrate or pallet, and which is mounted in an alignment with an off-center relationship with respect to the center of the transport beam. In addition, the system for transporting includes a plurality of drive beams (50). Each drive beam includes a plurality of horizontally-oriented guide wheels (35) disposed on a top surface of the drive beam, the guide wheels engaging the channel of the transport beam. Each drive beam also includes a plurality of vertically-oriented wheel assemblies (40) disposed in a plurality of U-shaped cavities (52) in the drive beam. A motor is provided with each of the drive beams to drive the vertically-oriented wheel assemblies. A shield (60), provided below the drive beam, ensures that contamination does not reach the interior of the sputtering chamber. |
