| 发明名称 |
Positive-working resist composition |
| 摘要 |
<p>A positive-working resist composition comprising (A) a quinonediazide compound, (B) an alkali-soluble resin, and (C) a solvent system comprising 2-heptanone, ethyl lactate and gamma -butyrolactone in which the quinonediazide compound exhibits a very high solubility and which characteristics such as sensitivity, profile and coatability are excellent.</p> |
| 申请公布号 |
EP0742489(A1) |
申请公布日期 |
1996.11.13 |
| 申请号 |
EP19960107202 |
申请日期 |
1996.05.07 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY LIMITED |
发明人 |
NAMBA, KATSUHIKO;TATEKAWA, KAORU;MORIUMA, HIROSHI;UETANI, YASUNORI |
| 分类号 |
G03F7/004;G03F7/022;H01L21/027;(IPC1-7):G03F7/022 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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