| 发明名称 |
Chelating reagent containing photoresist stripper composition |
| 摘要 |
<p>A non-corrosive photoresist composition containing:
<UnorderedLists id="ula01" listStyle="none"><ListItem>(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;</ListItem><ListItem>(b) 70-20% by weight of selected amine compounds;</ListItem><ListItem>(c) an effective amount of a chelating reagent comprising a mono- or poly-valent acid type of ligand covalently attached to a polymeric or oligomeric backbone; and</ListItem><ListItem>(d) optionally 0-10% by weight of selected amino acid having a hydroxyl group.</ListItem></UnorderedLists></p> |
| 申请公布号 |
EP0742495(A1) |
申请公布日期 |
1996.11.13 |
| 申请号 |
EP19960302873 |
申请日期 |
1996.04.24 |
| 申请人 |
OCG MICROELECTRONIC MATERIALS, INC. |
发明人 |
HONDA, KENJI |
| 分类号 |
G03F7/32;C11D7/32;C11D7/36;C11D7/50;G03F7/42;(IPC1-7):G03F7/42 |
主分类号 |
G03F7/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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