发明名称 |
Benzothiazolylsuccinic acid containing photoresist stripper composition |
摘要 |
<p>A non-corrosive photoresist composition containing:
<UnorderedLists id="ula01" listStyle="none"><ListItem>(a) 20-70% by weight of an organic polar solvent having a dipole moment of more than 3.5;</ListItem><ListItem>(b) 70-20% by weight of selected amine compounds;</ListItem><ListItem>(c) 0.1-10% by weight of (2-benzothiozolylthio)-succinic acid.</ListItem></UnorderedLists></p> |
申请公布号 |
EP0742493(A1) |
申请公布日期 |
1996.11.13 |
申请号 |
EP19960302871 |
申请日期 |
1996.04.24 |
申请人 |
OCG MICROELECTRONIC MATERIALS, INC. |
发明人 |
HONDA, KENJI;MAW, TAISHIH |
分类号 |
C11D7/32;C11D7/34;C11D7/50;G03F7/42;(IPC1-7):G03F7/42 |
主分类号 |
C11D7/32 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|