发明名称 SEMICONDUCTOR COATING FILM FORMING EQUIPMENT, AND THIN FILM SOLAR CELL AND FORMING METHOD OF THIN FILM SOLAR CELL
摘要 PURPOSE: To obtain an equipment capable of forming a thin film solar cell wherein optical deterioration is little while high initial conversion efficiency is maintained, by a method wherein a substrate is carried in a specified direction in a glow discharge space, and a substrate heating means heats the substrate at different temperatures in the carrying direction of the substrate. CONSTITUTION: The equipment consists of reaction chambers 502-504, exhausting means 523-525 for vacuumizing the reaction chambers 502-504, gas introducing means 526-528 for introducing gas into the reaction chamber 502-504, glow discharge generating means 515-517 installed in the reaction chambers 502-504, and substrate heating means 510-514 installed in the reaction chambers 502-504. A substrate 401 is carried in a specified direction in a glow discharge space formed by the glow discharge generating means 515-517. The substrate heating means 510-514 heats the substrate 401 at different temperatures in the carrying direction of the substrate 401. For example, a flexible substrate 401 is carried by a roll to roll system.
申请公布号 JPH08298333(A) 申请公布日期 1996.11.12
申请号 JP19960069391 申请日期 1996.02.28
申请人 SEMICONDUCTOR ENERGY LAB CO LTD;TDK CORP 发明人 SHINOHARA HISATO;ARAI YASUYUKI
分类号 C23C16/46;C23C16/52;H01L21/205;H01L31/04 主分类号 C23C16/46
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