| 摘要 |
PURPOSE: To produce a heat ray cut-off glass high in transparency and radio wave transmissivity by providing a transparent protective film of a metal and/or a nitride on one surface of a WSiO film of the heat ray cut-off glass composed mainly of the WSiO film. CONSTITUTION: The tungsten-silicon multiple oxide film and an oxide dielectric film are successively formed on the surface of glass and the transparent protective film composed of the metal and/or the nitride is provided on one surface of the WSiO film. The transparent protective film is formed for improving the durability of the WSiO film and is composed of the metal and/or the nitride of Ti, Zr, Al, Si. A particularly preferable example is ZrSi2 Nx (X=2-4) or the like. The film is formed by a sputtering method using a target obtained by pressing and sintering a film forming element mixture or by a well-known method such as vacuum deposition method. The film thickness of the WSiO film is preferably 100-1300Å. As the dielectric film, the oxide film of Zn, Sn, Al or the like is preferable.
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