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发明名称
Verfahren zur Abscheidung einer Siliziumoxidschicht
摘要
申请公布号
DE19516669(A1)
申请公布日期
1996.11.07
申请号
DE19951016669
申请日期
1995.05.05
申请人
SIEMENS AG, 80333 MUENCHEN, DE
发明人
ZVONIMIR, GABRIC, 85604 ZORNEDING, DE;SPINDLER, OSWALD, DR.RER.NAT., 85591 VATERSTETTEN, DE
分类号
C23C16/40;C23C16/44;C23C16/455;H01L21/31;H01L21/316;(IPC1-7):C23C16/44
主分类号
C23C16/40
代理机构
代理人
主权项
地址
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