| 摘要 |
PURPOSE:To provide a photosensitive compsn. for planographic plate making having excellent sensitization and mechanical properties by incorporating a copolymer of a epsilon-caprolactone modified acrylic monomer, acrylonitrile, etc., and diazo sensitizing agent into the compsn. CONSTITUTION:a): The epsilon-caprolactone modified acrylic (meth)acrylic monomer expressed by the formula, b): the acrylonitrile and/or methacrylonitrile, and c): carboxyl group-contg. monomer (acrylic acid, maleic acid, etc.) are copolymerized and the acid value of the copolymer is specified to 5-50. In the formula, R1 denotes a hydrogen atom, methyl group; R2 denotes an alkylene group of 2-8C; (n) denotes 1-7. The resultant copolymer and the diazo sensitizing agent are incorporated into the compsn. to prepare the photosensitive compsn. for planographic plate making. A crosslinking reaction is effected between the hydroxyl group of a) the acrylic monomer and the b) diazo sensitizing agent to improve the sensitivity of the sensitizing agent and the mechanical strength. Since such compsn. is used, the sensitization, mechanical properties and durability are improved. |
