发明名称 |
Method and apparatus for plasma treatment of a surface |
摘要 |
A radiofrequency wave apparatus and method which provides a relatively high concentration of reactive species from a plasma for the treatment of a surface particularly of a substrate (31) with a complex geometry in a holder (62) which masks a portion of the substrate. The radiofrequency waves are preferably microwaves or UHF waves. The apparatus and method is particularly useful for rapid plasma assisted chemical vapor deposition of diamond on a portion of the substrate, particularly on surfaces of objects with complex geometries such as a drill (60) or a seal ring (64).
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申请公布号 |
US5571577(A) |
申请公布日期 |
1996.11.05 |
申请号 |
US19950418383 |
申请日期 |
1995.04.07 |
申请人 |
BOARD OF TRUSTEES OPERATING MICHIGAN STATE UNIVERSITY |
发明人 |
ZHANG, JIE;ASMUSSEN, JES |
分类号 |
H05H1/46;B23P15/32;C23C16/26;C23C16/27;C23C16/50;C23C16/511;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H05H1/30 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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