发明名称 Wafer holder for semiconductor wafer polishing machine
摘要 A semi-conductor wafer polishing machine having at least one polishing pad assembly and at least one wafer holder positioned to hold a semi-conductor wafer against the polishing pad assembly includes a joint having two axes of rotation intersecting at a center of rotation. A wafer chuck is supported on the joint adjacent the periphery of the chuck to provide higher material removal rates at the center of the wafer than the periphery of the wafer during polishing.
申请公布号 US5571044(A) 申请公布日期 1996.11.05
申请号 US19940321086 申请日期 1994.10.11
申请人 ONTRAK SYSTEMS, INC. 发明人 BOLANDI, HOOMAN;WELDON, DAVID E.
分类号 B24B37/04;H01L21/304;(IPC1-7):B24B7/22 主分类号 B24B37/04
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