| 摘要 |
PURPOSE: To obtain a resist compsn. more excellent in sensitivity and resolution than a conventional chemical amplification type negative type resist, having satisfactory aging stability from the end of exposure for forming an image to PEB treatment and easy to handle. CONSTITUTION: This resist compsn. contains 100 pts.wt. alkali-soluble resin, 0.5-20 pts.wt. compd. which generates an acid under radiation, 3-70 pts.wt. at least one of melamine and urea resins each having methylol and/or alkoxymethyl groups substd. at N-positions as a crosslinking agent and at least one of hexamethoxymethylmelamine and dimethoxymethylurea as a sensitivity improver. The amt. of this sensitivity improver is 5-40wt.% of the amt. of the crosslinking agent.
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