| 摘要 |
PURPOSE: To improve thermal efficiency, to shorten the number and time for manufacture, to allow patterning with high resolution and to attain the use of a wide range of substrate materials by locally irradiating the parts corresponding to the desired optical waveguide patterns of a material layer formed on a substrate with heat rays. CONSTITUTION: An underclad layer 2 is formed on the quarts substrate 1 and a sol prepd. by mixing silicon alkoxide and germanium alkoxide with water, shrinkage relieving agent, catalyst, thickener, etc., is applied. This sol is dried to cause condensation polymn., by which a gen film 3 is formed. A pair of mask 4 meeting the desired optical waveguide patterns is then put on the gel film 3. The mask 4 is thereafter irradiated with a laser beam 5 to locally irradiate the surface of the dry gel film 3 with the laser beam 5 to the shapes of the patterns of the mask 4. As a result, the gel film 3 is heated to the shapes of the patterns of the mask 4 and is sintered. The pair of gel film 3 after the sintering is developed by a soln. prepd. by mixing alcohol and acid, by which the unnecessary gel film 3 exclusive of the parts sintered by the irradiation with the laser beam 5 is removed. |
