| 摘要 |
An exposure apparatus according to the present invention comprises a projection optical system for transferring a pattern of an image on a mask onto a photosensitive substrate, a plurality of alignment optical systems for independently detecting a plurality of alignment marks provided at least on said mask and detecting associated alignment marks through respective objective lenses provided corresponding thereto, and a variable optical system for obtaining a reduced image of the mask, set between a first plane on which the mask is to be located and a second plane which is parallel to the first plane and on which the objective lenses are to be located. Particularly, the variable optical system is so designed as to avoid overlap of beams entering the respective objective lenses provided for the alignment optical systems upon observation of the associated alignment marks through the respective alignment optical systems.
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