发明名称 PRODUCTION OF PELLICLE FILM FOR SEMICONDUCTOR LITHOGRAPHY
摘要 <p>PURPOSE: To remove an unnecessary film without stains or contamination of a pellicle film and a frame by removing the unnecessary film by using a solvent and a cutter having such a mechanism that prevents the unnecessary film after cutting from touching the frame surface. CONSTITUTION: In the process to remove an unnecessary film in the production of a pellicle by using a cutter and a solvent which can solve the pellicle film, the cutter used is equipped with such a film avoiding mechanism that the whole or a part of the blade is tilted to the advancing direction during cutting to prevent the unnecessary film after cutting from touching the frame surface. Namely, the cutter is inserted and moved along the adhesion part of the pellicle film on the pellicle frame, then a solvent which can solve the pellicle film is dropped on the cutter to cut and remove the unnecessary part of the pellicle film. Thereby, the solvent can be supplied with good controllability and the unnecessary film can be cut and removed with good reproducibility without producing stains or contamination on the pellicle film and the pellicle frame.</p>
申请公布号 JPH08292553(A) 申请公布日期 1996.11.05
申请号 JP19950095754 申请日期 1995.04.21
申请人 SHIN ETSU CHEM CO LTD 发明人 NAGATA AKIHIKO;KASHIDA SHU
分类号 G03F1/00;G03F1/62;H01L21/027 主分类号 G03F1/00
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