发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE: To provide a positive photosensitive composition used in a far ultraviolet region, in which the ratio of the dissolving velocity of an exposure part and a non-exposure part to a developing solution is large. CONSTITUTION: In a positive type photosensitive composition containing a photo- acid generating agent, an insolubilized alkali soluble resin, an alkali soluble resin, a dissolving retarder, and an organic solvent, the photo-acid generating agent is a compound represented by Ar<1> -SO2 -NH-NH-SO2 -Ar<2> . In the formula, Ar<1> and Ar<2> are the same or different aromatic groups.
申请公布号 JPH08286367(A) 申请公布日期 1996.11.01
申请号 JP19950092611 申请日期 1995.04.18
申请人 MITSUBISHI CHEM CORP 发明人 OCHIAI TAMEICHI;OTSUBO YUKI
分类号 G03F7/004;C08L101/00;C08L101/12;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 主分类号 G03F7/004
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