| 摘要 |
PURPOSE: To stably and productively provide a photomask with high pattern position accuracy and high quality by making a shading film material on a transparent substrate amorphous. CONSTITUTION: A shading film is formed on a transparent substrate and the material of the shading film is made amorphous. Amorphous means such a property that in the measurement using X-ray diffraction, the intensity of the diffraction line is very weak, the peak of the diffraction line is broad and indistinct, or the diffraction line has no peak, thereby making litative analysis of the material difficult to conduct from the diffraction line. Photomask blank in which the main component of the shading film is metallic chromium is preferable. By forming the shading film with an amorphous thin film (preferably chromium nitride thin film), characteristics such as mechanical strength and smoothness on the surface are satisfied and at the same time stress can be controlled. As the preferable example, by using chromium nitride having a specified composition as a sputtering target or vaporizing raw material, amorphous chromium nitride thin film is easily formed. |
