| 摘要 |
PURPOSE: To form a color filter free from uneven color with the small number of processes at high productivity by providing at least a radiation setting type adhesive layer and a photosensitive colored pattern in this order on a base material. CONSTITUTION: A mask 7 is mounted closely or with a certain space by press- fitting the photosensitive colored transfer layer 3 side of a transfer sheet 1 provided with the photosensitive colored transfer layer 3, which is to be weakened in adhesivity to a supporting body 2 by radiation, to the radiation setting type adhesive layer 5 on a color filter base material 4, on which a black matrix is previously formed. A latent image is formed by exposing image-wise. The transfer sheet 1 is separated from the base material 4, a part corresponding to the exposed part of the photosensitive colored transfer layer 3 is transferred and a transferred pattern 9a and a non-transferred pattern 9b are formed. The color filter patterns of red, green and blue are formed on a substrate 4 by repeating the process with the change of color of the colored transfer layer 3. |
