| 摘要 |
PURPOSE: To provide a processing method and a device for a presensitized plate which continuously performs superior processing by preventing any change in development performance. CONSTITUTION: A cooling part 4 which decreases the temperature of a presensitized plate PS lower than the upper limit of the liquid temperature latitude of developer D by jetting out cooling water on the face in a support body side of the presensitized plate PS or radiating the heat so as to carry to a development part 5 is arranged between a heating part 3 for heat treating a presensitized plate substrate PS completed exposure and the development part 5 for developing the heat-treated presensitized plate PS by dipped in the developer D. |
