发明名称 |
PROCESSING UNIT |
摘要 |
PURPOSE: To provide a processing technique which enables improvement in productivity. CONSTITUTION: In a processing chamber (body) 1, a stage (setting stage) 2 for supporting a processing target 3 is provided, and a guide plate 4 forming a predetermined flow passage 5 between the surface of the processing target 3 and the guide plate 4 is provided. A processing fluid 7 containing ozone generated by an ozone generation source is supplied from a nozzle 6a to the flow passage 5. A light source 8 for irradiating the processing target 3 with a light for exciting the processing fluid 7 via the guide plate 4 is provided near and along the surface of the guide plate 4. The nozzle 6a is opened between the processing target 3 and the guide plate 4 from the lateral side on the periphery of the processing target 3. The processing fluid 7 is guided from one peripheral portion of the processing target 3 toward the other. |
申请公布号 |
JPH08288269(A) |
申请公布日期 |
1996.11.01 |
申请号 |
JP19960131469 |
申请日期 |
1996.05.27 |
申请人 |
HITACHI TOKYO ELECTRON CO LTD;HITACHI LTD |
发明人 |
OFUKU AKIHIRO;OOSAKAYA TAKAYOSHI |
分类号 |
G03F7/40;H01L21/027;H01L21/302;H01L21/304;H01L21/306;H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
G03F7/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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