| 摘要 |
<p>A device for vapour-depositing a material on a substrate (112), characterised in that it comprises a housing in which n sources (44, 46) for vaporising the material are provided, and means for directing, during vaporisation, the vapour emitted by said sources to the substrate, said means being formed by walls (59) or screens defining compartments within the housing, each vaporisation source (44, 46) being arranged in one compartment. The device may also contain means for moving the substrate for a more regular deposition.</p> |
