| 摘要 |
<p>A magnetic field enhanced plasma etch reactor system (100) for generating a radially-directed magnetic field within a reaction chamber (108). The reactor system (100) comprises a reaction chamber (108) for containing a plasma and a plurality of electromagnetic coils (118, 120, 122, 124) disposed about a reaction region within the reaction chamber (108). When each coil is driven with a current of similar magnitude, the electromagnetic coils (118, 120, 122, 124) produce a radially-directed magnetic field within the reaction chamber (108). The radially-directed magnetic field uniformly distributes the plasma throughout a bulk plasma region. Consequently, a substrate (116) that is etched by such a uniform plasma has an improved uniformity in the etch pattern on the substrate (116). <IMAGE></p> |
