| 摘要 |
<p>The basic apparatus comprises a first surface plate (3) for supporting a polishing object (W), a driving mechanism for rotating the first surface plate (3), and a second surface plate (2) arranged so as to confront the first surface plate (3). An abrasive cloth (1) is attached to the second surface plate (2), and a vibration detector (10, 10A, or 10B) attached to the first surface plate (3) or the second surface plate (2) for detecting vibration during polishing. A controlling portion (17) controls the polishing operation of the first surface plate (3) and the second surface plate (2). A signal analyzing unit analyses the vibration intensity detected by the a vibration detector (10, 10A, or 10B) through frequency analysis, integrates the vibration intensity relative to time, and transmits a polishing stop signal to stop polishing operation of the first surface plate (3) and the second surface plate (2) to the controlling portion (17) when variation in a resultant integral value relative to time is less than a first reference value or when the resultant integral value is less than a second reference value. <IMAGE></p> |
