发明名称 |
Process for treatment of thin films based upon metallic oxide or nitride |
摘要 |
A treatment process for the purpose of improving the chemical and/or physical durability of film containing one or more metallic oxides, nitrides, oxynitrides or oxycarbides deposited on a transparent substrate by a cathodic sputtering technique, notably assisted by a magnetic field and preferably reactive in the presence of oxygen. Said process consists of subjecting the film to a low energy ion beam.
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申请公布号 |
US5569362(A) |
申请公布日期 |
1996.10.29 |
申请号 |
US19930165493 |
申请日期 |
1993.12.13 |
申请人 |
SAINT-GOBAIN VITRAGE INTERNATIONAL |
发明人 |
LERBET, FRANCOIS;PILLIAS, DANIELE |
分类号 |
B01J19/08;C03C17/22;C03C17/245;C03C23/00;C23C14/06;C23C14/58;(IPC1-7):C23C14/34 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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