| 摘要 |
PURPOSE: To stably produce a very thin uniform film by a sputtering method. CONSTITUTION: When a releasing film for a preform for glass forming is produced by a sputtering method, gas having a lower mol. wt. than Ar or a gaseous mixture of the gas with Ar is used as sputtering gas, a group VIa, VIII, Ib or IVb metal of the Periodic Table is used as a target material and the substrate temp. of the preform is set at <=100 deg.C. The objective thin film of 10-300Åthickness is produced.
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