发明名称 |
Stencil mask |
摘要 |
A stencil mask for use in a photochemical reaction process includes a path extending between the rear and front surfaces thereof. The path is used with a window for passing photons so as to supply a reactive medium and discharge an exhaust medium containing reaction products. Further, the path also serves as a space for separating an object from a pattern on a mask substrate. The path has a depth which is smaller than a minimum value attained by a semiconductor manufacturing process.
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申请公布号 |
US5569569(A) |
申请公布日期 |
1996.10.29 |
申请号 |
US19950377306 |
申请日期 |
1995.01.24 |
申请人 |
SANYO ELECTRIC CO., LTD. |
发明人 |
GOTO, TAKASHI;TERAKADO, SHINGO |
分类号 |
G03F1/16;H01L21/302;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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