发明名称 Two-stage annealing process for amorphous ribbon used in an EAS marker
摘要 A two-step continuous annealing process is applied to an amorphous metal alloy ribbon. During the first annealing step, a saturating transverse magnetic field is applied, and the field is omitted during the second annealing step. After the two annealing steps, the material is cut into discrete strips suitable for use as active elements in pulsed-field magnetomechanical EAS markers. The resulting markers exhibit satisfactory total frequency shift and ring-down signal amplitude characteristics, without excessive sensitivity to bias field variations.
申请公布号 US5568125(A) 申请公布日期 1996.10.22
申请号 US19950508580 申请日期 1995.07.28
申请人 SENSORMATIC ELECTRONICS CORPORATION 发明人 LIU, NEN-CHIN
分类号 G01R33/18;G01V15/00;G08B13/24;H01F1/153;H01L41/20;(IPC1-7):G08B13/24 主分类号 G01R33/18
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