| 发明名称 |
REMOVAL OF SURFACE CONTAMINANTS BY IRRADIATION FROM HIGH-ENERGY SOURCE |
| 摘要 |
<p>A method and apparatus for removing surface contaminants from the surface of a substrate by high-energy irradiation is provided. The invention enables removal of surface contaminants without altering of the substrate's underlying molecular structure. The source of high-energy irradiation may comprise a pulsed laser (11).</p> |
| 申请公布号 |
LV11116(B) |
申请公布日期 |
1996.10.20 |
| 申请号 |
LV19940000095 |
申请日期 |
1994.05.04 |
| 申请人 |
CAULDRON LIMITED PARTNERSHIP |
发明人 |
ENGELSBERG,AUDREY C. |
| 分类号 |
H01L21/302;B08B7/00;B23K26/14;G03F7/20;H01L21/00;H01L21/268;H01L21/28;H01L21/304;H01L21/306;H01L21/3065;H01L21/3205;H01L21/321;H01L21/768;(IPC1-7):B08B7/00 |
主分类号 |
H01L21/302 |
| 代理机构 |
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