ROTATIONALLY DRYING DEVICE FOR SEMICONDUCTOR WAFER,申请号JP19950073108-传众专利搜索

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发明名称	ROTATIONALLY DRYING DEVICE FOR SEMICONDUCTOR WAFER
摘要
申请公布号	JPH08274061(A)	申请公布日期	1996.10.18
申请号	JP19950073108	申请日期	1995.03.30
申请人	NEC YAMAGUCHI LTD	发明人	OKIMURA HITOSHI
分类号	F26B11/08;F26B25/00;H01L21/304;(IPC1-7):H01L21/304	主分类号	F26B11/08
代理机构		代理人
主权项
地址

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