| 摘要 |
<p>PURPOSE: To provide a method for manufacturing an electron emission element, etc., whereby a conductive film containing a metal and/or an inorganic metallic compound is obtainable without performing heat treatments at temperatures of the melting or decomposition temperature of a material for formation of the conductive film and higher, with the result that the thickness of the conductive film can be restrained from decreasing and variation in such element characteristics as sheet resistance value can be reduced. CONSTITUTION: A method for manufacturing an electron emission element having a conductive film 4 forming an electron emission part 5 between electrodes 2, 3 is described. Processes for forming the conductive film where the electron emission part is formed include a process in which a material containing an organometallic compound and/or an inorganic metallic compound as its main components and a decomposition agent for decomposing the material are imparted onto the substrate.</p> |
