VACUUM CHUCK OF SEMICONDUCTOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide the vacuum chuck of a semiconductor manufacturing equipment for holding a semiconductor wafer during the period wherein the manufacturing steps such as photo etching are performed. SOLUTION: This device includes the base having a vacuum hole 200 formed in the at least two directions from the center of a vacuum chuck 10'. Therefore, the uniformity of the thickness of photoresist applied on a wafer is improved. The moving efficiency of the device is improved by reducing scratches generated by shock by forming the vacuum chuck 10' with ceramics.