发明名称 FORMATION OF MICROSCOPIC PATTERN
摘要 PURPOSE: To provide a method, which is capable of mass-producing such a microscopic pattern as a quantum fine wire (a two-dimensional microscopic pattern) or a quantum box (a three-dimensional microscopic pattern), which can not be formed by a conventional technique, under a good controllability and reproducibility. CONSTITUTION: A particle beam 3 is locally irradiated on a thin film 2, which consists of a compound or an alloy containing two kinds or more of atoms, to make the specified atoms within the thin film 2 recoil selectively outside of the thin film 2, whereby the ratio of the number of the specified atoms to the number of the unspecified atoms in a region 4 irradiated with the beam is made lower compared with that in other site in the thin film 2 and a microscopic pattern, which has a thickness equal with that of the thin film 2 and has a planar form to respond to the region 4 irradiated with the beam 3, is formed.
申请公布号 JPH08274075(A) 申请公布日期 1996.10.18
申请号 JP19950076005 申请日期 1995.03.31
申请人 SHIMADZU CORP 发明人 NAGAMACHI SHINJI
分类号 H01L21/302;G03F7/004;G03F7/20;H01L21/027;(IPC1-7):H01L21/306 主分类号 H01L21/302
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