发明名称 Infrared-rays sensor and manufacturing method therefor
摘要 An infrared sensor includes a substrate, an insulator layer formed on the substrate, and a heat-sensitive semiconductor layer having a temperature dependent electrical resistance with a relatively large temperature coefficient of resistance. In order to improve sensitivity of the heat-sensitive semiconductor layer for detecting infrared rays, high concentration impurity semiconductor regions are positioned on either side of the semiconductor layer to form a semiconductor section. The high concentration impurity semiconductor sections have a higher absorption coefficient of infrared rays than the semiconductor layer. Thus, the semiconductor section itself both detects and absorbs infrared rays with or without providing any heat-absorbing layer. Further, electrodes are connected to each high-concentration impurity layer, which form an ohmic contact therewith.
申请公布号 AU3432795(A) 申请公布日期 1996.10.17
申请号 AU19950034327 申请日期 1995.10.17
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TOMOHIRO ISHIKAWA;MASASHI UENO;OSAMU KANEDA
分类号 G01J1/02;H01L27/14;H01L27/146;H01L37/02 主分类号 G01J1/02
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