Strahlungsempfindliche Polymere mit Naphthochinon-2-diazid-4-sulfonyl-Gruppen und deren Verwendung in einem positiv arbeitenden Aufzeichnungsmaterial,申请号DE19925007077-传众专利搜索

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发明名称	Strahlungsempfindliche Polymere mit Naphthochinon-2-diazid-4-sulfonyl-Gruppen und deren Verwendung in einem positiv arbeitenden Aufzeichnungsmaterial
摘要
申请公布号	DE59207077(D1)	申请公布日期	1996.10.17
申请号	DE19925007077	申请日期	1992.02.20
申请人	HOECHST AG, 65929 FRANKFURT, DE	发明人	ROESCHERT, HORST, DR., W-6531 OBER HILBERSHEIM, DE;MERREM, HANS-JOACHIM, DR., BASKING RIDGE, NEW JERSEY 07920, DE;PAWLOWSKI, GEORG, DR., W-6200 WIESBADEN, DE;FUCHS, JUERGEN, W-6093 FLOERSHEIM/WICKER, DE;DAMMEL, RALPH, DR., COVENTRY, RHODE ISLAND 02816, US
分类号	G03F7/023;(IPC1-7):G03F7/023	主分类号	G03F7/023
代理机构		代理人
主权项
地址

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