SUSCEPTER IN DEVICE FOR CVD

摘要

In a CVD apparatus deposition CVD film by attaching a wafer, the apparatus includes a suscepter having the center on which iron balls is disposed and being a stage on which wafer is attached; a heater which maintains the temperature and is attached on the upper side of the suscepter; a taper hole shape vacuum line to be connected to the suscepter and heater; a nitrogen supplying line connected to the vacuum line; and an injection nozzle to inject a reactive gas.