Reduced residue hard surface cleaner

摘要

The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising: (a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25 DEG C., and mixtures of such solvents; (b) an effective amount of at least one semi-polar nonionic surfactant, said surfactant having the structure: wherein R1 is C5-20 alkyl, R2 and R3 are both C1-4 alkyl, or -(CH2)p-OH, although R2 and R3 do not have to be equal, and n is 1-5, and p is 1-6; (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and (d) the remainder as substantially all water.