| 摘要 |
<p>PURPOSE:To provide an absolute calibration member for the dimensional calibration of an electron-beam length-measuring instrument. CONSTITUTION:A semiconductor substrate having a surface with an orientation of (110) is used and an irregular pattern of 0.1mum in pitch is formed on the surface by laser interference exposure and wet anisotropic etching. Therefore, a diffraction grating 5 having a vertical cross sectional structure with a high aspect ratio is formed on the surface of the semiconductor substrate. The diffraction grating 5 allows the dimensional calibration of an electron-beam length- measuring instrument to be carried out with an accuracy of an order of 0.01mum.</p> |
