| 摘要 |
<p>A projection exposure apparatus includes an illumination optical system for illuminating a first object (1) with exposure light (IL), a projection optical system (3) for projecting a pattern of the first object illuminated by the illumination optical system onto a second object (4), an alignment optical system (8-11) for illuminating the second object with alignment light (AL) of a wavelength different from the exposure light and for detecting alignment light from the second object through the projection optical system, and a moving mechanism for moving the first object to a position (A), different from a position (B) of the first object for the projection exposure, so that the alignment optical system detects the alignment light from the second object through the projection optical system. <IMAGE></p> |
