Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens,申请号EP19930113752-传众专利搜索

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发明名称	Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens
摘要
申请公布号	EP0585840(B1)	申请公布日期	1996.10.16
申请号	EP19930113752	申请日期	1993.08.27
申请人	KABUSHIKI KAISHA TOSHIBA	发明人	YAMAZAKI, YUICHIRO;MIYOSHI, MOTOSUKE;NAGAI, TAKAMITSU
分类号	H01J37/073;(IPC1-7):H01J37/073	主分类号	H01J37/073
代理机构		代理人
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地址

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