| 摘要 |
The invention which is the subject of this application relates to the provision of improvements to a plasma source which can be used, for example, in conjunction with magnetrons with metal targets for creating reacted metal layers on substrates such as, for example, ophthalmic lens. The improvements to the plasma source allow the plasma created to be controlled such that the flow of plasma from the plasma source is controlled as it passes towards the coated substrates. The ability to control the path of the plasma allows the plasma itself to be denser in form and, furthermore, reduces the area over which the plasma reacts thereby reducing wastage of materials while increasing the effectiveness of the plasma created. |
