| 摘要 |
PURPOSE: To improve properties such as air barrier, heat-resistance, solvent- resistance, and cold-resistance, by forming a thin metallic film or metal oxide film layer by means of a vacuum thin film formation method at one face or both faces of a plastic film. CONSTITUTION: A metallic thin film layer or a metal oxide thin film layer is formed by means of a vacuum thin film formation method on one face or both faces of a plastic film to constitute an inner cover. It is preferable to form a heat-adhesive resin layer at least at one face thereof and also to use a silicon oxide as a thin film layer of metallic or metal oxides. In a heating method of vacuum deposition as the vacuum thin film formation method, it is preferable to reduce the generation of vapor-depositing splashes in the vapor deposition. In a thin film layer forming on one face or both faces of a plastic film, when a silicon oxide is used as an inevitable component, the steam-barrier property is especially improved. It is preferable to retain a strength with an easily peeling property and an easily opening property as a heat adhesive material forming the heat adhesive resin layer. |
