| 摘要 |
<p>PURPOSE: To provide a manufacturing method of an X-ray mask with an X-ray absorbing film having extremely small internal stress of an X-ray absorber film besides uniform stress distribution inside the face and being excellent in fine workability. CONSTITUTION: In a method of manufacturing an X-ray mask provided with X-ray transmitting films 2a, 2b and an X-ray absorbing film 3a containing tantalum and boron in the range of atomic rations (Ta/B) 8.5/1.5 to 7.5/2.5, X-ray transmitting films 2a, 2b are formed on both faces of a substrate 1a and an X-ray absorption film 3a is formed on the X-ray transmitting film 2a by a sputtering method using Xe as sputtering gas followed by annealing treatment. Here, the X-ray transmitting film 2a has a surface roughness 0.2-20nm (Ra: central line average roughness).</p> |
