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发明名称
METHOD FOR MEASURING SURFACE TEMPERATURE OF SEMICONDUCTOR WAFER SUBSTRATE AND HEAT-TREATING APPARATUS
摘要
申请公布号
KR960013995(B1)
申请公布日期
1996.10.11
申请号
KR19890009928
申请日期
1989.07.12
申请人
TOKYO ELECTRON KK.
发明人
ARIMA, JIRO;TSUJIMURA, HIROJI;NARITA, TOMONORI;TAKEBUCHI, HIROKI
分类号
G01J5/00;G01J5/52;G01J5/60;G01J5/62;H01L21/66;(IPC1-7):G01J5/00
主分类号
G01J5/00
代理机构
代理人
主权项
地址
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