DEPOSITION OF LAMINAR COMPOUND THIN FILM OF BISMUTH

摘要

PURPOSE: To obtain a method for depositing a laminar compound thin film of bismuth through a simple process. CONSTITUTION: The method for depositing a laminar compound thin film of bismuth comprises a step for depositing the laminar compound thin film of bismuth having predetermined composition on a substrate 3 disposed oppositely to the target 2 placed in a vacuum tank 1 by irradiating the target 2 with a laser pulse beam thereby heating the target 2 locally and evaporating the substance composing the target 2, and a step for feeding an assist gas containing oxygen through a duct 8 to the step for depositing the laminar compound.