| 摘要 |
<p>PURPOSE: To simplify the structure of a positioning apparatus, and to improve the prealignment accuracy. CONSTITUTION: When a stage 22 is moved to a reference position in a reference flat surface, a wafer 60 is held by a loading arm 62, and moved on the stage 22. Then, a controller 24 moves the stage 22 via a motor 32 (or 38) in a Y direction. The controller 24 calculates the rotating error of the wafer 60 based on the output of an interferometer 26 and the outputs of sensors 50a, 50b during control to move the stage. When the error is calculated, the controller 24 controls to so drive a revolving arm 12 having a revolving unit 16 and the arm 62 as to rotate the wafer 60 by the amount corresponding to the calculated error. Thus, the wafer 60 is positioned in the rotating direction by the arm 12 on the stage 22.</p> |
