发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING MULTICOLORED PATTERN AND MULTICOLORED PATTERN FORMING METHOD USING SAME
摘要 PURPOSE: To prevent the cracking of a film, uneven coloring and the distortion of picture elements when a color filter is produced and to enhance the productivity of the color filter by incorporating specified network polysilane and an org. solvent. CONSTITUTION: This resin compsn. contains network polysilane having a wt. average mol.wt. of >=10,000 and an org. solvent. In the network polysilane, Si atoms each bonding to three or four adjacent Si atoms account for 5-50% of the total number of Si atoms. Since the valence of an Si atom is 4, each Si atom bonding to three or less adjacent Si atoms in the polysilane bond to one or more hydrocarbon groups, alkoxy groups or H atoms besides three or less Si atoms. The hydrocarbon groups are preferably 1-10C optionally halogen substituted aliphatic hydrocarbon groups or 6-14C aromatic hydrocarbon groups. The network polysilane can be obtained by polycondensing a halosilane mixture by heating.
申请公布号 JPH08262727(A) 申请公布日期 1996.10.11
申请号 JP19960010852 申请日期 1996.01.25
申请人 NIPPON PAINT CO LTD 发明人 MIKAMI SHIGERU;IMAMURA TAKESHI;TSUSHIMA HIROSHI;WATANABE HIDEMI;SUMIYOSHI IWAO
分类号 G03F7/004;C25D13/00;G02B5/20;G02F1/1335;G03F7/075;G03F7/40 主分类号 G03F7/004
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