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发明名称
PERIPHERY EXPOSURE METHOD OF SEMICONDUCTOR WAFER AND PERIPHERY ALIGNER
摘要
申请公布号
JPH08264416(A)
申请公布日期
1996.10.11
申请号
JP19950063999
申请日期
1995.03.23
申请人
MITSUBISHI ELECTRIC CORP
发明人
MUTA MARI;MATSUE YOSUKE
分类号
G03F7/20;H01L21/027;(IPC1-7):H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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