发明名称 |
METHOD OF LUBRICATING CONTACT METAL-METAL SYSTEMS IN METAL WORKING OPERATIONS WITH CYCLOHEXYL ETHERS |
摘要 |
FIELD: chemical industry. SUBSTANCE: surface contact metal- metal systems can be lubricated by applying thereto composition comprising ether where the ether has a full film bonding coefficient of not higher than about 0.05 at pressure of from about 0.5 to about 1.2 GPa, at 50 C and sliding rate of from 0.5 to about 10 ms. Ether is represented by general formula:wherein R, R, Rand Rand m are as defined in the specification. The claimed composition may be mixed with solvent for preparing solution or emulsion prior to being applied to metallic surface. EFFECT: improved properties of the lubricating composition. |
申请公布号 |
RU94042223(A) |
申请公布日期 |
1996.10.10 |
申请号 |
RU19940042223 |
申请日期 |
1994.09.20 |
申请人 |
KVAKER KEMIKAL KORPOREJSHN |
发明人 |
ROBERT D.EHVANS;KVENTIN D.KRAFT |
分类号 |
C10M105/34;C10M105/38;C10M171/00;C10M173/00 |
主分类号 |
C10M105/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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